1. 新型场效应晶体管的器件设计与工艺实现（主要涵盖TFT、MOSFET等技术范畴）

2. 光电集成电路的创新设计与应用开发（主要涉及半导体显示、传感、存储等产业领域）

1. 主持多项与新型TFT背板电路设计和制造工艺开发相关的产学合作项目

2. 主持或参与国家自然科学基金面上、上海市自然科学基金、国家自然科学基金重点、973课题等政府项目

共发表论文80余篇（其中SCI论文20余篇），申请发明专利10余项。论文代表作如下：

1. Jing Cheng, Yongliang Chen, Chengyuan Dong, “Compact modeling of persistent photoconductivity effects in amorphous InGaZnO thin film transistors”, Solid State Electroncies, 238, 109414, (2026)
   

2. Yongliang Chen, Liangdong Li, Zecui Gao, Hennrik Schmidt, Thomas Huber, Enrico Franzke, Chengyuan Dong*, “Amorphous indium-gallium-zinc-oxide thin film transistors passivated by annealing oxidized MoOx:Ta layers”, Mater. Sci. Semicond. Process., 205，110339 （2026）

3. Zenghui Fan, Ao Shen, Yong Xia, Chengyuan Dong *, “Amorphous InGaZnO Th in-Film Transistors with Double-Stacked Channel Layers for Ultraviolet Light Detection”, Micromachines, 13，2099 （2022）
   

4. Chengyuan Dong*, Guochao Liu, Ying Zhang, Guofeng Feng, and Yan Zhou, “Double-Stacked Gate Insulators SiOx/TaOx for Flexible Amorphous InGaZnO Thin Film Transistors”, Mater. Sci. Semicond. Process., 96，99-103 (2019)

5. Wen Zhang, Zenghui Fan, Ao Shen, and Chengyuan Dong*,“Atmosphere Effect in Post Annealing Treatments for Amorphous InGaZnO Thin Film Transistors with SiOx Passivation Layers”, Micromachines, 12, 1551 (2021)

6. Chengyuan Dong*, Jianeng Xu, Yan Zhou, Ying Zhang, and Haiting Xie, " Light-Illumination Stability of Amorphous InGaZnO Thin Film Transistors in Oxygen and Moisture Ambience", Solid State Electron., 153, 74-78 (2019)

7. Ying Zhang, Haiting Xie, and Chengyuan Dong*, “Electrical Performance and Bias-stress Stability of Amorphous InGaZnO Thin-Film Transistors with Buried-Channel Layers”, Micromachines, 10，779 (2019)
   

8. Haiting Xie, Qi Wu, Ling Xu, Lei Zhang, Guochao Liu, and Chengyuan Dong*," Nitrogen-Doped Amorphous Oxide Semiconductor Thin Film Transistors with Double-Stacked Channel Layers", Applied Surface Science, 387, 237–243 (2016)

9.  Zhe Hu, Chengyuan Dong*, Daxiang Zhou, Yuting Chen, Jie Wu, Haiting Xie, Cheng-Lung Chiang, Po-Lin Chen, Tzu-Chieh Lai, Chang-Cheng Lo and A. Lien, " Thermal Stability of Amorphous InGaZnO Thin Film Transistors with Different Oxygen-Contained Active Layers", J. Disp. Technol., 11，610-614 (2015）

10. Chengyuan Dong*, Jie Wu, Yuting Chen, Daxiang Zhou, Zhe Hu, Haiting Xie, Cheng-Lung Chiang, Po-Lin Chen, Tzu-Chieh Lai, Chang-Cheng Lo and A. Lien, “Comparative study of amorphous indium gallium zinc oxide thin film transistors passivated by sputtered non-stoichiometric aluminum and titanium oxide layers”, Mater. Sci. Semicond. Process., 27, 719-724 (2014)

11. Chengyuan Dong*, Yuting Chen, Zhe Hu, Jie Wu, Daxiang Zhou, Haiting Xie, Cheng-Lung Chiang, Po-Lin Chen, Tzu-Chieh Lai, Chang-Cheng Lo and A. Lien, “Process development of inverted-staggered amorphous InGaZnO thin film transistors with wet-etched electrodes”, J. Soc. Inf. Display, 21/11, 461-466 (2014)

12. Zenghui Fan, Ao Shen, Yong Xia, Chengyuan Dong *, “Amorphous InGaZnO Th in-Film Transistors with Double-Stacked Channel Layers for Ultraviolet Light Detection”, Micromachines, 13，2099 （2022）

13. Haiting Xie, Yan Zhou, Ying Zhang, and Chengyuan Dong*," Chemical Bonds in Nitrogen-Doped Amorphous InGaZnO Thin Film Transistors", Results in Physics, 11, 1080-1086 (2018)

14. Haiting Xie, Guochao Liu, Lei Zhang, Yan Zhou, Chengyuan Dong*, "Amorphous Oxide Thin Film Transistors with Nitrogen-Doped Hetero-Structure Channel Layers", Applied Sciences, 7,1099 (2017)

15. Haiting Xie, Qi Wu, Ling Xu, Lei Zhang, Guochao Liu, and Chengyuan Dong*," Nitrogen-Doped Amorphous Oxide Semiconductor Thin Film Transistors with Double-Stacked Channel Layers", Applied Surface Science, 387, 237–243 (2016)

16. Zhe Hu, Chengyuan Dong*, Daxiang Zhou, Yuting Chen, Jie Wu, Haiting Xie, Cheng-Lung Chiang, Po-Lin Chen, Tzu-Chieh Lai, Chang-Cheng Lo and A. Lien, " Thermal Stability of Amorphous InGaZnO Thin Film Transistors with Different Oxygen-Contained Active Layers", J. Disp. Technol., 11，610-614 (2015）

主编出版论文集2部：

1. Chengyuan Dong*, Thin Film Microelectronic Devices and Circuits, MDPI（2025）

2. Chengyuan Dong*, Recent Advances in Thin Film Electronic Devices, MDPI（2022）

教材编著：

1. 董承远，《半导体显示电子学》，清华大学出版社（2026）

2. 董承远，《薄膜晶体管原理及应用》（第2版），清华大学出版社（2023）

课程开设：

1. “显示电子学”，48学时，研究生专业课 （2010~2015, 1018年至今）

2. “薄膜晶体管原理及应用”，48学时，本科生专业课 （2012~2017）
   

SID北京分会2021年度杰出贡献奖

IOP2018年度优秀审稿人奖

物理学会2021年度优秀审稿人奖